Pulse electroplating power supply is a new type of electroplating power supply, and it is also a kind of power supply that is widely used in the electroplating industry. In the process of using the pulse plating power supply, the following issues need to be paid attention to.

1. The distance between the pulse electroplating power supply and the electroplating tank
In order to ensure that the pulse current waveform is not distorted when it is introduced into the plating tank, and the attenuation is small, it is desirable that the distance between the pulse electroplating power supply and the plating tank is 2-3m during installation, otherwise the pulse The trailing edge of the current waveform has a greater influence, and the electroplating will not achieve the expected effect.

2. The wire connection method of the cathode and anode. The wire connection method of the
DC power supply is not suitable for the connection of the pulse power supply. The output connection of the pulse electroplating power supply. It is hoped that the capacitance between the two wires can offset the transmission inductance effect of the wire, so the cathode and anode wires The best way is to cross the twisted pairs and lead them to the side of the plating tank to keep the pulse waveform unchanged.

3.
Since the selection of the wire is a pulse power supply, in order to avoid the Tiff effect, when selecting the wire, you should choose multiple core wires as the connection wire between the pulse power supply and the plating tank. The multiple core wires are twisted, and the wire capacitance in between can be offset. Its inductance effect.
The specification of the wire must meet the rated current that it passes, because the current density of the pulse current is much larger than the current density of the average current. Therefore, it is necessary to consider the current heating effect generated by the current of the pulse power supply to ensure that the pulse power supply reaches the plating The attenuation of the slot is minimal.

Paying attention to these problems during the use of pulsed electroplating power supply will help improve the use effect of pulsed electroplating power supply and also help improve the quality of electroplating operations.